Aerosol-assisted CVD of cadmium diselenoimidodiphosphinate and formation of a newiPr2N2P3 + ion supported by combined DFT and mass spectrometric studies
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Date
2016-10-25
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Publisher
Royal Society of Chemistry (RSC)
Abstract
Aerosol-assisted chemical vapour deposition (AACVD) of Cd[(SePiPr2)2N]2 is shown to deposit cadmium
selenide and/or cadmium phosphide on glass substrates, depending upon the growth conditions. The phase, structure, morphology and composition of the films were characterised by X-ray powder diffraction (XRD), scanning electron microscopy, energy dispersive X-ray analysis and X-ray photoelectron spectroscopy. The XRD indicated a hexagonal phase for cadmium selenide, whilst cadmium phosphide was monoclinic. Pyrolysis gas chromatography-mass spectrometry and density functional theory were used to deduce a breakdown mechanism for the deposition that favoured the formation of a new aromatic iPr2N2P3+ ion.
Description
Depositon of cadmium selenide together with an aromatic ion from cadmium diselenide complex.
Keywords
Chalcogenides, Single-Source Precursors, Cadmium Selenide, AACVD, DFT, XRD